Nanoscale Imaging and Circuit Edit with Helios NanoLab 660 Dual Beam Fib
With the addition of our Helios NanoLab 660, we are ready to face the smallest geometry technologies, with the highest resolutions.
Given the minimum resolution of 0.6nm from 15 to 2kV, and 0.7nm at 1kV, we are able to non-destructively view the smallest features.
Using the improved Tomahawk ion column, our operators are able to achieve the highest precision circuit edits and cross sections.
The improved column in the Helios NanoLab 660 also allows for high-current modes as well, allowing a broad range of edit sizes and speeds. Loaded with the newest recipes from FEI, accuracy and efficiency are pushed to a maximum.
The multi-gas system allows for a range of selective milling and depositions. Currently, we are able to deposit platinum or tungsten to meet your low resistance needs, as well as oxide to protect delicate edits and prevent corrosion. With targeted oxide and metal etch chemistries, any manner of edit can be ensured clean and thorough.
The most notable specifications as given on the FEI datasheet for the Helios NanoLab 660 include:
Electron beam resolution @ optimum WD
- 0.6 nm at 30 kV (STEM*)
- 0.6 nm from 15 kV to 2 kV
- 0.7 nm at 1 kV
- 1.0 nm at 500 V (ICD*)
Electron beam resolution @ coincident point
- 0.6 nm at 15 kV
- 0.9 nm at 5 kV
- 1.2 nm at 1 kV
Tomahawk ion column
- Superior high current performance, with up to 65 nA max beam current
- Lowest voltage (500 V) for ultimate sample preparation quality
- Time-of-flight (TOF) correction
- 15 apertures
- Elstar in-lens SE detector (TLD-SE)
- Elstar in-lens BSE detector (TLD-BSE)
- Elstar in-column SE detector (ICD)
- Elstar in-column BSE detector (MD)
- Everhart-Thornley SE detector (ETD)
- Maximum size: 150 mm diameter with full rotation (larger samples possible with limited rotation)
- Maximum clearance between stage and coincidence point: 55 mm
- High-resolution multi-stub mount holder
- Vise specimen holder to clamp irregular, large or heavy specimens to the specimen stage*
- Universal mounting base (UMB) for stable, flexible mounting of many combinations of samples and holders such as flat and pretilt stubs, and row holders for TEM grids*